A study of defects in AlGaN/GaN heterostructures

J. H. Na, H. S. Lee, H. C. Jeon, Y. S. Jeong, C. J. Park, Y. S. Park, H. Y. Cho, T. W. Kang, J. E. Oh, K. S. Chung, K. H. Lee

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

The authors study defects in AlGaN/GaN heterostructures using DLTS. The AlGaN/GaN heterostructures used were grown by RF-plasma assisted molecular beam epitaxy (PA-MBE) on sapphire substrates. The Al mole fraction was kept at 0.2 for all the AlGaN layers. Two electron traps were detected. The trap levels are Ec-0.15eV and Ec-0.25eV, respectively. These traps are attributed to point defects and dislocations through analysing DLTS features such as the measured fill pulse time. The trap related to the dislocation was reduced by annealing.

Original languageEnglish
Title of host publicationMBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages189-190
Number of pages2
ISBN (Electronic)0780375815, 9780780375819
DOIs
StatePublished - 2002
Event12th International Conference on Molecular Beam Epitaxy, MBE 2002 - San Francisco, United States
Duration: 15 Sep 200220 Sep 2002

Publication series

NameMBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy

Conference

Conference12th International Conference on Molecular Beam Epitaxy, MBE 2002
Country/TerritoryUnited States
CitySan Francisco
Period15/09/0220/09/02

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