A study on the transition of copper oxide by the incorporation of nitrogen

Song Yi Ahn, Kyung Park, Daehwan Choi, Jozeph Park, Yong Joo Kim, Hyun Suk Kim

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10 Scopus citations

Abstract

In the present study, the effects of nitrogen incorporation on the transition of a p-type copper oxide semiconductor are investigated. The properties of sputtered copper oxide and nitrogen-incorporated copper oxide are evaluated and compared at various nitrogen gas flow rates. The results indicate that the addition of nitrogen results in an increased optical bandgap, accompanied by significantly reduced tail states compared to pristine copper oxide. In addition, X-ray diffraction and X-ray photoelectron spectroscopy reveal that the incorporation of nitrogen stimulates the transition from copper (II) oxide to copper (I) oxide.

Original languageEnglish
Article number1099
JournalElectronics (Switzerland)
Volume8
Issue number10
DOIs
StatePublished - Oct 2019

Keywords

  • CuON
  • Nitrogen incorporation
  • P-type oxide semiconductor
  • Reactive sputtering
  • Thin-film transistors

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