Attractive Migration and Coalescence: A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface

W. C. Yang; M. Zeman; H. Ade; R. J. Nemanich

doi:10.1103/PhysRevLett.90.136102

Attractive Migration and Coalescence: A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface

W. C. Yang, M. Zeman, H. Ade, R. J. Nemanich

Department of Physics

North Carolina State University

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

The dynamics and coarsening of [Formula presented] islands on Si(111) surfaces are studied in real time with photoelectron emission microscopy. A significant fraction of events are observed in which nearby islands move attractively toward each other and subsequently coalesce. It is proposed that attractive island migration is due to the growth-decay flow of the island edges driven by a nonuniform surface concentration around the islands. The local surface concentration is induced by the neighboring islands. This coarsening mechanism should significantly affect the evolution of the island distribution.

Original language	English
Pages (from-to)	4
Number of pages	1
Journal	Physical Review Letters
Volume	90
Issue number	13
DOIs	https://doi.org/10.1103/PhysRevLett.90.136102
State	Published - 2003

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10.1103/PhysRevLett.90.136102

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title = "Attractive Migration and Coalescence: A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface",

abstract = "The dynamics and coarsening of [Formula presented] islands on Si(111) surfaces are studied in real time with photoelectron emission microscopy. A significant fraction of events are observed in which nearby islands move attractively toward each other and subsequently coalesce. It is proposed that attractive island migration is due to the growth-decay flow of the island edges driven by a nonuniform surface concentration around the islands. The local surface concentration is induced by the neighboring islands. This coarsening mechanism should significantly affect the evolution of the island distribution.",

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T2 - A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface

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AU - Zeman, M.

AU - Ade, H.

AU - Nemanich, R. J.

PY - 2003

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N2 - The dynamics and coarsening of [Formula presented] islands on Si(111) surfaces are studied in real time with photoelectron emission microscopy. A significant fraction of events are observed in which nearby islands move attractively toward each other and subsequently coalesce. It is proposed that attractive island migration is due to the growth-decay flow of the island edges driven by a nonuniform surface concentration around the islands. The local surface concentration is induced by the neighboring islands. This coarsening mechanism should significantly affect the evolution of the island distribution.

AB - The dynamics and coarsening of [Formula presented] islands on Si(111) surfaces are studied in real time with photoelectron emission microscopy. A significant fraction of events are observed in which nearby islands move attractively toward each other and subsequently coalesce. It is proposed that attractive island migration is due to the growth-decay flow of the island edges driven by a nonuniform surface concentration around the islands. The local surface concentration is induced by the neighboring islands. This coarsening mechanism should significantly affect the evolution of the island distribution.

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U2 - 10.1103/PhysRevLett.90.136102

DO - 10.1103/PhysRevLett.90.136102

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JO - Physical Review Letters

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IS - 13

ER -

Attractive Migration and Coalescence: A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface

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