Attractive Migration and Coalescence: A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface

W. C. Yang; M. Zeman; H. Ade; R. J. Nemanich

doi:10.1103/PhysRevLett.90.136102

Attractive Migration and Coalescence: A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface

W. C. Yang
, M. Zeman
, H. Ade
, R. J. Nemanich

Department of Physics

North Carolina State University

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

The dynamics and coarsening of [Formula presented] islands on Si(111) surfaces are studied in real time with photoelectron emission microscopy. A significant fraction of events are observed in which nearby islands move attractively toward each other and subsequently coalesce. It is proposed that attractive island migration is due to the growth-decay flow of the island edges driven by a nonuniform surface concentration around the islands. The local surface concentration is induced by the neighboring islands. This coarsening mechanism should significantly affect the evolution of the island distribution.

Original language	English
Pages (from-to)	4
Number of pages	1
Journal	Physical Review Letters
Volume	90
Issue number	13
DOIs	https://doi.org/10.1103/PhysRevLett.90.136102
State	Published - 2003

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10.1103/PhysRevLett.90.136102

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title = "Attractive Migration and Coalescence: A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface",

abstract = "The dynamics and coarsening of [Formula presented] islands on Si(111) surfaces are studied in real time with photoelectron emission microscopy. A significant fraction of events are observed in which nearby islands move attractively toward each other and subsequently coalesce. It is proposed that attractive island migration is due to the growth-decay flow of the island edges driven by a nonuniform surface concentration around the islands. The local surface concentration is induced by the neighboring islands. This coarsening mechanism should significantly affect the evolution of the island distribution.",

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journal = "Physical Review Letters",

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T2 - A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface

AU - Yang, W. C.

AU - Zeman, M.

AU - Ade, H.

AU - Nemanich, R. J.

PY - 2003

Y1 - 2003

N2 - The dynamics and coarsening of [Formula presented] islands on Si(111) surfaces are studied in real time with photoelectron emission microscopy. A significant fraction of events are observed in which nearby islands move attractively toward each other and subsequently coalesce. It is proposed that attractive island migration is due to the growth-decay flow of the island edges driven by a nonuniform surface concentration around the islands. The local surface concentration is induced by the neighboring islands. This coarsening mechanism should significantly affect the evolution of the island distribution.

AB - The dynamics and coarsening of [Formula presented] islands on Si(111) surfaces are studied in real time with photoelectron emission microscopy. A significant fraction of events are observed in which nearby islands move attractively toward each other and subsequently coalesce. It is proposed that attractive island migration is due to the growth-decay flow of the island edges driven by a nonuniform surface concentration around the islands. The local surface concentration is induced by the neighboring islands. This coarsening mechanism should significantly affect the evolution of the island distribution.

UR - https://www.scopus.com/pages/publications/85038298748

U2 - 10.1103/PhysRevLett.90.136102

DO - 10.1103/PhysRevLett.90.136102

M3 - Article

AN - SCOPUS:85038298748

SN - 0031-9007

VL - 90

SP - 4

JO - Physical Review Letters

JF - Physical Review Letters

IS - 13

ER -

Attractive Migration and Coalescence: A Significant Process in the Coarsening of [Formula presented] Islands on the Si(111) Surface

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