Characterization of CF4 plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

Sung Jin Jo; Chang Su Kim; Seung Yoon Ryu; Jong Bok Kim; Joo Hyon Noh; Se Jong Lee; Hong Koo Baik

doi:10.1143/JJAP.46.6814

Characterization of CF₄ plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

Sung Jin Jo
, Chang Su Kim
, Seung Yoon Ryu
, Jong Bok Kim
, Joo Hyon Noh
, Se Jong Lee
, Hong Koo Baik

Department of Physics

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

The CF₄ plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.

Original language	English
Pages (from-to)	6814-6816
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	46
Issue number	10 A
DOIs	https://doi.org/10.1143/JJAP.46.6814
State	Published - 9 Oct 2007

Keywords

Chemical composition
Fluorine
Organic light-emitting diodes
Plasma treatment
X-ray photoemlssion spectroscopy

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10.1143/JJAP.46.6814

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Jo, S. J., Kim, C. S., Ryu, S. Y., Kim, J. B., Noh, J. H., Lee, S. J., & Baik, H. K. (2007). Characterization of CF₄ plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 46(10 A), 6814-6816. https://doi.org/10.1143/JJAP.46.6814

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title = "Characterization of CF4 plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy",

abstract = "The CF4 plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.",

keywords = "Chemical composition, Fluorine, Organic light-emitting diodes, Plasma treatment, X-ray photoemlssion spectroscopy",

author = "Jo, \{Sung Jin\} and Kim, \{Chang Su\} and Ryu, \{Seung Yoon\} and Kim, \{Jong Bok\} and Noh, \{Joo Hyon\} and Lee, \{Se Jong\} and Baik, \{Hong Koo\}",

year = "2007",

month = oct,

day = "9",

doi = "10.1143/JJAP.46.6814",

language = "English",

volume = "46",

pages = "6814--6816",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "10 A",

}

Jo, SJ, Kim, CS, Ryu, SY, Kim, JB, Noh, JH, Lee, SJ & Baik, HK 2007, 'Characterization of CF₄ plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 46, no. 10 A, pp. 6814-6816. https://doi.org/10.1143/JJAP.46.6814

Characterization of CF₄ plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy. / Jo, Sung Jin; Kim, Chang Su; Ryu, Seung Yoon et al.
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 46, No. 10 A, 09.10.2007, p. 6814-6816.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Characterization of CF4 plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

AU - Jo, Sung Jin

AU - Kim, Chang Su

AU - Ryu, Seung Yoon

AU - Kim, Jong Bok

AU - Noh, Joo Hyon

AU - Lee, Se Jong

AU - Baik, Hong Koo

PY - 2007/10/9

Y1 - 2007/10/9

N2 - The CF4 plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.

AB - The CF4 plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.

KW - Chemical composition

KW - Fluorine

KW - Organic light-emitting diodes

KW - Plasma treatment

KW - X-ray photoemlssion spectroscopy

UR - https://www.scopus.com/pages/publications/35348857398

U2 - 10.1143/JJAP.46.6814

DO - 10.1143/JJAP.46.6814

M3 - Article

AN - SCOPUS:35348857398

SN - 0021-4922

VL - 46

SP - 6814

EP - 6816

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

IS - 10 A

ER -

Characterization of CF₄ plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

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Keywords

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