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Comparative study of atomic-layer-deposited stacked (HfO 2/Al2O3) and nanolaminated (HfAlOx) dielectrics on In0.53Ga0.47As

  • Chandreswar Mahata
  • , Young Chul Byun
  • , Chee Hong An
  • , Sungho Choi
  • , Youngseo An
  • , Hyoungsub Kim
  • Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

69 Scopus citations

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