Comparative study on breakdown characteristics for InGaAs metamorphic high electron mobility transistor and InGaAs/InP-composite channel metamorphic high electron mobility transistor

  • Seok Gyu Choi
  • , Jung Hun Oh
  • , Bok Hyung Lee
  • , Byeong Ok Lim
  • , Sung Woon Moon
  • , Dong Hoon Shin
  • , Sam Dong Kim
  • , Jin Koo Rhee

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

To perform a comparative study, we experimented on two differential epitaxial structures, the conventional metamorphic high-electron-mobility- transistor (MHEMT) using the InAlAs/InGaAs/InAlAs structure and the InP-composite-channel MHEMT adopting the In-AlAs/InGaAs/InP structure. Compared with the conventional MHEMT. the InP-composite-channel MHEMT shows improved breakdown performance; more than approximately 3.8 V. This increased breakdown voltage can be explained by the lower impact ionization coefficient of the InP-composite-channel MHEMT than that of the conventional MHEMT. The InP-composite-channel MHEMT also shows improved Radio Frequency characteristics of S21 gain of approximately 4.35 dB at 50 GHz. and a cut-off frequency (fT) and a maximum frequency of oscillation (f max) of approximately 124 GHz and 240 GHz, respectively, were obtained. These are due to decreases in go and gm.

Original languageEnglish
Pages (from-to)616-620
Number of pages5
JournalIEICE Transactions on Electronics
VolumeE89-C
Issue number5
DOIs
StatePublished - May 2006

Keywords

  • Impact ionization coefficient
  • InP-composite channel
  • MHEMT
  • Output conductance

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