@inproceedings{cb77b6fe52f7499fb10987c8d8f6bad0,
title = "Dielectric property and breakdown study of metal-insulator-metal capacitor",
abstract = "Advanced metal-insulator-metal capacitors with ultra thin (EOT~2.3-5.3nm) RF sputterdeposited TaAlOx dielectric layers having excellent electrical properties have been fabricated. With low FCC value, the small change in quadratic VCC value in hysteresis curve is also found which shows a good stability of MIM capacitor. The Weibull distribution function, which is based on the weakest-link theory, is employed to analyze the effect of EOT on the breakdown of the MIM capacitors.",
keywords = "High-k, Hysteresis, MIM capacitor, TaAlO, Weibull",
author = "Hota, {M. K.} and C. Mahata and S. Mallik and Sarkar, {C. K.} and Maiti, {C. K.}",
year = "2009",
language = "English",
isbn = "9788184651522",
series = "Codec - 2009 - 4th International Conference on Computers and Devices for Communication",
booktitle = "Codec - 2009 - 4th International Conference on Computers and Devices for Communication",
note = "4th International Conference on Computers and Devices for Communication, Codec 2009 ; Conference date: 14-12-2009 Through 16-12-2009",
}