TY - GEN
T1 - Dip pen nanolithography® (DPN®) and the deposition of multiple materials in nanopatterning
AU - Levesque, Tom
AU - Jang, Jae Won
AU - Smetana, Alexander
AU - Stiles, Paul
PY - 2010
Y1 - 2010
N2 - Multiplexed patterns of hydrogels and phospholipids with fluorescent dyes are accomplished by dippen nanolithography® (DPN®). For example, four different dyes-labeled hydrogel dot arrays are DPN® patterned within 50 × 50 μm2 area, and two different dyes-doped phospholipids dots and letters with less than 1 μm line-width are also DPN®patterned. We demonstrate that multi-ink patterns with precise alignment are able to be printed by DPN® within a micron-scale. Moreover, this multi-ink DPN® patterning methodology can be extended to delicate bio-materials printing in a subcellular scale with accurate positioning control.
AB - Multiplexed patterns of hydrogels and phospholipids with fluorescent dyes are accomplished by dippen nanolithography® (DPN®). For example, four different dyes-labeled hydrogel dot arrays are DPN® patterned within 50 × 50 μm2 area, and two different dyes-doped phospholipids dots and letters with less than 1 μm line-width are also DPN®patterned. We demonstrate that multi-ink patterns with precise alignment are able to be printed by DPN® within a micron-scale. Moreover, this multi-ink DPN® patterning methodology can be extended to delicate bio-materials printing in a subcellular scale with accurate positioning control.
KW - Dip pen nanolithography (DPN)
KW - Multiplexing
KW - Nano lithography platform (NLP)
KW - Phospholipids
KW - Poly(ethylene glycol)
UR - http://www.scopus.com/inward/record.url?scp=77952408488&partnerID=8YFLogxK
U2 - 10.1109/ICQNM.2010.16
DO - 10.1109/ICQNM.2010.16
M3 - Conference contribution
AN - SCOPUS:77952408488
SN - 9780769539522
T3 - 4th International Conference on Quantum, Nano and Micro Technologies, ICQNM 2010
SP - 48
EP - 52
BT - 4th International Conference on Quantum, Nano and Micro Technologies, ICQNM 2010
T2 - 4th International Conference on Quantum, Nano and Micro Technologies, ICQNM 2010
Y2 - 10 February 2010 through 16 February 2010
ER -