Effects of reoxidation on band alignment in N-incorporated SiON films as a function of sequential thermal annealing in NO and N H3
- W. J. Lee
- , M. H. Cho
- , K. B. Chung
- , Y. S. Lee
- , D. C. Kim
- , S. Y. Choi
- , U. I. Chung
- , J. T. Moon
Research output: Contribution to journal › Article › peer-review
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Scopus
citations