Effects of reoxidation on band alignment in N-incorporated SiON films as a function of sequential thermal annealing in NO and N H3

W. J. Lee, M. H. Cho, K. B. Chung, Y. S. Lee, D. C. Kim, S. Y. Choi, U. I. Chung, J. T. Moon

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Fingerprint

Dive into the research topics of 'Effects of reoxidation on band alignment in N-incorporated SiON films as a function of sequential thermal annealing in NO and N H3'. Together they form a unique fingerprint.

Material Science