Electrochemical and Physical Properties of Electroplated CuO thin films

V. Dhanasekaran, T. Mahalingam

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

Cupric oxide thin films have been prepared on ITO glass substrates from an aqueous electrolytic bath containing CuSO4 and tartaric acid. Growth mechanism has been analyzed using cyclic voltammetry. The role of pH on the structural, morphological, compositional, electrical and optical properties of CuO films is investigated. The structural studies revealed that the deposited films are polycrystalline in nature with a cubic structure. The preferential orientation of CuO thin films is found to be along (111) plane. X-ray line profile analysis has been carried out to determine the microstructural parameters of CuO thin films. The pyramid shaped grains are observed from SEM and AFM images. The optical band gap energy and electrical activation energy is found to be 1.45 and 0.37 eV, respectively. Also, the optical constants of CuO thin films such as refractive index (n), complex dielectric constant (ε) extinction coefficient (k) and optical conductivity (σ) are evaluated.

Original languageEnglish
Pages (from-to)250-259
Number of pages10
JournalJournal of Nanoscience and Nanotechnology
Volume13
Issue number1
DOIs
StatePublished - Jan 2013

Keywords

  • Electrochemical preparation
  • Materials characterization
  • Thin films
  • XRD

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