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Electrochemical deposition and characterization of cupric oxide thin films
V. Dhanasekaran
, T. Mahalingam
, R. Chandramohan
, Jin Koo Rhee
, J. P. Chu
Department of Electronics & Electrical Engineering
World Top 2% Scientist
Alagappa University
Sree Sevugan Annamalai College
Dongguk University
National Taiwan University of Science and Technology
Research output
:
Contribution to journal
›
Article
›
peer-review
104
Scopus citations
Overview
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Material Science
Thin Films
100%
Oxide Compound
100%
Electrodeposition
100%
Film
60%
Scanning Electron Microscopy
20%
X-Ray Diffraction
20%
Morphology
20%
Oxide Film
20%
Surface Morphology
20%
Refractive Index
20%
Permittivity
20%
Indium Tin Oxide
20%
Surface Roughness
20%
Engineering
Thin Films
100%
Indium-Tin-Oxide
20%
Energy Engineering
20%
Oxide Film
20%
Deposited Film
20%
Ray Diffraction
20%
Extinction Coefficient
20%
Refractive Index
20%
Glass Substrate
20%
Dielectrics
20%
Refractivity
20%
Atomic Force Microscopy
20%
Polycrystalline
20%
Surface Morphology
20%
Mixed Phase
20%
Alkaline Solution
20%