Enhanced Short-Term Memory Plasticity of WOx-Based Memristors by Inserting AlO_x Thin Layer

ITO/WO_x/TaN and ITO/WO_x/AlO_x/TaN memory cells were fabricated as a neuromorphic device that is compatible with CMOS. They are suitable for the information age, which requires a large amount of data as next-generation memory. The device with a thin AlO_x layer deposited by atomic layer deposition (ALD) has different electrical characteristics from the device without an AlO_x layer. The low current is achieved by inserting an ultra-thin AlO_x layer between the switching layer and the bottom electrode due to the tunneling barrier effect. Moreover, the short-term memory characteristics in bilayer devices are enhanced. The WO_x/AlO_x device returns to the HRS without a separate reset process or energy consumption. The amount of gradual current reduction could be controlled by interval time. In addition, it is possible to maintain LRS for a longer time by forming it to implement long-term memory.