Erratum: Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

M. C. Zeman; C. C. Fulton; G. Lucovsky; R. J. Nemanich; W. C. Yang

doi:10.1063/1.2201707

Erratum: Publisher's Note: Thermal stability of TiO ₂, ZrO ₂, or HfO ₂ on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

M. C. Zeman, C. C. Fulton, G. Lucovsky, R. J. Nemanich, W. C. Yang

Department of Physics

North Carolina State University

Research output: Contribution to journal › Comment/debate

1 Scopus citations

Original language	English
Article number	109902
Journal	Journal of Applied Physics
Volume	99
Issue number	10
DOIs	https://doi.org/10.1063/1.2201707
State	Published - 15 May 2006

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10.1063/1.2201707

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@article{00889529ead542e19cae11ba5e7eb893,

title = "Erratum: Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))",

author = "Zeman, {M. C.} and Fulton, {C. C.} and G. Lucovsky and Nemanich, {R. J.} and Yang, {W. C.}",

year = "2006",

month = may,

day = "15",

doi = "10.1063/1.2201707",

language = "English",

volume = "99",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "10",

}

TY - JOUR

T1 - Erratum

T2 - Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

AU - Zeman, M. C.

AU - Fulton, C. C.

AU - Lucovsky, G.

AU - Nemanich, R. J.

AU - Yang, W. C.

PY - 2006/5/15

Y1 - 2006/5/15

UR - http://www.scopus.com/inward/record.url?scp=33744811191&partnerID=8YFLogxK

U2 - 10.1063/1.2201707

DO - 10.1063/1.2201707

M3 - Comment/debate

AN - SCOPUS:33744811191

SN - 0021-8979

VL - 99

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10

M1 - 109902

ER -

Erratum: Publisher's Note: Thermal stability of TiO 2, ZrO 2, or HfO 2 on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))

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Erratum: Publisher's Note: Thermal stability of TiO ₂, ZrO ₂, or HfO ₂ on Si(100) by photoelectron emission microscopy (Journal of Applied Physics (2006) 99 (023519))