Fabrication and electrical characteristics of graphene-based charge-trap memory devices

Sejoon Lee, Sung Min Kim, Emil B. Song, Kang L. Wang, David H. Seo, Sunae Seo

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Graphene-based non-volatile charge-trap memory devices were fabricated and characterized to investigate the implementation effect of both 2-dimensional graphene and the 3-dimensional memory structure. The single-layer-graphene (SLG) channel devices exhibit larger memory windows compared to the multi-layer-graphene (MLG) channel devices. This originates from the gate-coupling strength being larger in SLG devices than in MLG devices. Namely, the electrostatic charge screening effect becomes enhanced upon increasing the number of graphene layers; therefore, the gate tunability is reduced in MLG compared to SLG. The results suggest that SLG is more desirable for memory applications than MLG.

Original languageEnglish
Pages (from-to)108-112
Number of pages5
JournalJournal of the Korean Physical Society
Volume61
Issue number1
DOIs
StatePublished - Jul 2012

Keywords

  • Charge-trap memory
  • Field-effect transistor
  • Graphene
  • Nonvolatile memory

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