Abstract
Graphene-based non-volatile charge-trap memory devices were fabricated and characterized to investigate the implementation effect of both 2-dimensional graphene and the 3-dimensional memory structure. The single-layer-graphene (SLG) channel devices exhibit larger memory windows compared to the multi-layer-graphene (MLG) channel devices. This originates from the gate-coupling strength being larger in SLG devices than in MLG devices. Namely, the electrostatic charge screening effect becomes enhanced upon increasing the number of graphene layers; therefore, the gate tunability is reduced in MLG compared to SLG. The results suggest that SLG is more desirable for memory applications than MLG.
Original language | English |
---|---|
Pages (from-to) | 108-112 |
Number of pages | 5 |
Journal | Journal of the Korean Physical Society |
Volume | 61 |
Issue number | 1 |
DOIs | |
State | Published - Jul 2012 |
Keywords
- Charge-trap memory
- Field-effect transistor
- Graphene
- Nonvolatile memory