Fabrication of suspended fully metallic ultra-small capacitance nano-junctions

Chulki Kim; Hyun S. Kim; Jonghoo Park; Robert H. Blick

doi:10.1002/pssr.201004029

Fabrication of suspended fully metallic ultra-small capacitance nano-junctions

Chulki Kim, Hyun S. Kim, Jonghoo Park, Robert H. Blick

Department of Electronics & Electrical Engineering

2205 Engineering Hall

Research output: Contribution to journal › Article › peer-review

Abstract

We demonstrate the fabrication of freely suspended metallic islands using an SF₆ etching and deposition technique. The resulting structure consists of nanoscale islands connected to source and drain contacts by thin CF₂ layers. This enables operation of the suspended island as a coupled metal-insulatormetal (MIM) junction with application as ultra-sensitive nano-diodes.

Original language	English
Pages (from-to)	115-117
Number of pages	3
Journal	Physica Status Solidi - Rapid Research Letters
Volume	4
Issue number	5-6
DOIs	https://doi.org/10.1002/pssr.201004029
State	Published - Jun 2010

Keywords

Fabrication
Metal-insulator-metal junction
Nanoscale

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10.1002/pssr.201004029

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title = "Fabrication of suspended fully metallic ultra-small capacitance nano-junctions",

abstract = "We demonstrate the fabrication of freely suspended metallic islands using an SF6 etching and deposition technique. The resulting structure consists of nanoscale islands connected to source and drain contacts by thin CF2 layers. This enables operation of the suspended island as a coupled metal-insulatormetal (MIM) junction with application as ultra-sensitive nano-diodes.",

keywords = "Fabrication, Metal-insulator-metal junction, Nanoscale",

author = "Chulki Kim and Kim, {Hyun S.} and Jonghoo Park and Blick, {Robert H.}",

year = "2010",

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doi = "10.1002/pssr.201004029",

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AU - Kim, Chulki

AU - Kim, Hyun S.

AU - Park, Jonghoo

AU - Blick, Robert H.

PY - 2010/6

Y1 - 2010/6

N2 - We demonstrate the fabrication of freely suspended metallic islands using an SF6 etching and deposition technique. The resulting structure consists of nanoscale islands connected to source and drain contacts by thin CF2 layers. This enables operation of the suspended island as a coupled metal-insulatormetal (MIM) junction with application as ultra-sensitive nano-diodes.

AB - We demonstrate the fabrication of freely suspended metallic islands using an SF6 etching and deposition technique. The resulting structure consists of nanoscale islands connected to source and drain contacts by thin CF2 layers. This enables operation of the suspended island as a coupled metal-insulatormetal (MIM) junction with application as ultra-sensitive nano-diodes.

KW - Fabrication

KW - Metal-insulator-metal junction

KW - Nanoscale

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DO - 10.1002/pssr.201004029

M3 - Article

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EP - 117

JO - Physica Status Solidi - Rapid Research Letters

JF - Physica Status Solidi - Rapid Research Letters

IS - 5-6

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Fabrication of suspended fully metallic ultra-small capacitance nano-junctions

Abstract

Keywords

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