Facile Route to NiO Nanostructured Electrode Grown by Oblique Angle Deposition Technique for Supercapacitors

Vasudevan Kannan, Akbar I. Inamdar, Sambaji M. Pawar, Hyun Seok Kim, Hyun Chang Park, Hyungsang Kim, Hyunsik Im, Yeon Sik Chae

Research output: Contribution to journalArticlepeer-review

65 Scopus citations

Abstract

We report an efficient method for growing NiO nanostructures by oblique angle deposition (OAD) technique in an e-beam evaporator for supercapacitor applications. This facile physical vapor deposition technique combined with OAD presents a unique, direct, and economical route for obtaining high width-to-height ratio nanorods for supercapacitor electrodes. The NiO nanostructure essentially consists of nanorods with varying dimensions. The sample deposited at OAD 75° showed highest supercapacitance value of 344 F/g. NiO nanorod electrodes exhibits excellent electrochemical stability with no degradation in capacitance after 5000 charge-discharge cycles. The nanostructured film adhered well to the substrate and had 131% capacity retention. Peak energy density and power density of the NiO nanorods were 8.78 Wh/kg and 2.5 kW/kg, respectively. This technique has potential to be expanded for growing nanostructured films of other interesting metal/metal oxide candidates for supercapacitor applications.

Original languageEnglish
Pages (from-to)17220-17225
Number of pages6
JournalACS Applied Materials and Interfaces
Volume8
Issue number27
DOIs
StatePublished - 13 Jul 2016

Keywords

  • NiO
  • e-beam evaporation
  • electrochemical supercapacitor
  • nanostructures
  • oblique angle deposition

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