Abstract
We report an efficient method for growing NiO nanostructures by oblique angle deposition (OAD) technique in an e-beam evaporator for supercapacitor applications. This facile physical vapor deposition technique combined with OAD presents a unique, direct, and economical route for obtaining high width-to-height ratio nanorods for supercapacitor electrodes. The NiO nanostructure essentially consists of nanorods with varying dimensions. The sample deposited at OAD 75° showed highest supercapacitance value of 344 F/g. NiO nanorod electrodes exhibits excellent electrochemical stability with no degradation in capacitance after 5000 charge-discharge cycles. The nanostructured film adhered well to the substrate and had 131% capacity retention. Peak energy density and power density of the NiO nanorods were 8.78 Wh/kg and 2.5 kW/kg, respectively. This technique has potential to be expanded for growing nanostructured films of other interesting metal/metal oxide candidates for supercapacitor applications.
Original language | English |
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Pages (from-to) | 17220-17225 |
Number of pages | 6 |
Journal | ACS Applied Materials and Interfaces |
Volume | 8 |
Issue number | 27 |
DOIs | |
State | Published - 13 Jul 2016 |
Keywords
- NiO
- e-beam evaporation
- electrochemical supercapacitor
- nanostructures
- oblique angle deposition