Gradually tunable conductance in tio2/al2 o3 bilayer resistors for synaptic device

Hojeong Ryu, Sungjun Kim

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

In this work, resistive switching and synaptic behaviors of a TiO2/Al2 O3 bilayer device were studied. The deposition of Pt/Ti/TiO2/Al2 O3/TiN stack was confirmed by transmission electron microscopy (TEM) and energy X-ray dispersive spectroscopy (EDS). The initial state before the forming process followed Fowler-Nordheim (FN) tunneling. A strong electric field was applied to Al2 O3 with a large energy bandgap for FN tunneling, which was confirmed by the I-V fitting process. Bipolar resistive switching was conducted by the set process in a positive bias and the reset process in a negative bias. High-resistance state (HRS) followed the trap-assisted tunneling (TAT) model while low-resistance state (LRS) followed the Ohmic conduction model. Set and reset operations were verified by pulse. Moreover, potentiation and depression in the biological synapse were verified by repetitive set pulses and reset pulses. Finally, the device showed good pattern recognition accuracy (~88.8%) for a Modified National Institute of Standards and Technology (MNIST) handwritten digit database in a single layer neural network including the conductance update of the device.

Original languageEnglish
Article number440
Pages (from-to)1-7
Number of pages7
JournalMetals
Volume11
Issue number3
DOIs
StatePublished - Mar 2021

Keywords

  • Bilayer
  • Metal oxides
  • Neuromorphic system
  • Resistive switching
  • Synaptic device

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