Hf-aluminate films with and without an interfacial layer during growth and postannealing structural and electrical characteristics
- K. B. Chung
- , H. S. Chang
- , S. H. Lee
- , C. N. Whang
- , D. H. Ko
- , H. Kim
- , D. W. Moon
- , M. H. Cho
- Korea Research Institute of Standards and Science
- Yonsei University
- Sungkyunkwan University
Research output: Contribution to journal › Article › peer-review
3
Scopus
citations