High mobility p-type tin oxide thin-film by adopting passivation layer

Sonq Yi Ahn, Hyun Suk Kim

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The effects of SiO2 passivation on tin monoxide (SnO) semiconductor was investigated. In X-ray photoelectron spectroscopy studies revealed that the tail-state above valence band maximum was clearly detected in SiO2-capped SnO film which may improve the p-type conductivity. As a result, the resulting SnO thin-film transistors show enhanced electrical properties.

Original languageEnglish
Title of host publication26th International Display Workshops, IDW 2019
PublisherInternational Display Workshops
Pages573-576
Number of pages4
ISBN (Electronic)9781713806301
StatePublished - 2019
Event26th International Display Workshops, IDW 2019 - Sapporo, Japan
Duration: 27 Nov 201929 Nov 2019

Publication series

NameProceedings of the International Display Workshops
Volume2
ISSN (Print)1883-2490

Conference

Conference26th International Display Workshops, IDW 2019
Country/TerritoryJapan
CitySapporo
Period27/11/1929/11/19

Keywords

  • P-type SnO
  • Thin-film transistors SiO passivation

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