High mobility zinc oxynitride-TFT with operation stability under light-illuminated bias-stress conditions for large area and high resolution display applications

Myungkwan Ryu, Tae Sang Kim, Kyoung Seok Son, Hyun Suk Kim, Joon Seok Park, Jong Baek Seon, Seok Jun Seo, Sun Jae Kim, Eunha Lee, Hyungik Lee, Sang Ho Jeon, Seungwu Han, Sang Yoon Lee

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

23 Scopus citations

Abstract

In spite of the successful achievement of oxide-semiconductor (OS) technology in recent years, stability degradation especially at high mobility regime limits the application of oxide semiconductors in next generation displays. According to previous works, the instability is closely related to oxygen vacancies (Vo) causing persistent photoconductivity (PPC) [1,2]. From this point of view, zinc oxynitride (ZnON)[3] with small bandgap (1.3 eV) and high intrinsic mobility is attractive to overcome the performance issues of OS. In this paper, we report on ZnON-thin film transistors (TFTs) with field effect mobility near 100 cm2/Vs and operation stability(< 3 V) under light-illumination bias-stress. Our results demonstrate that ZnON-TFTs are strong candidates for pixel switching devices in ultra-high definition and large area displays.

Original languageEnglish
Title of host publication2012 IEEE International Electron Devices Meeting, IEDM 2012
Pages5.6.1-5.6.3
DOIs
StatePublished - 2012
Event2012 IEEE International Electron Devices Meeting, IEDM 2012 - San Francisco, CA, United States
Duration: 10 Dec 201213 Dec 2012

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
ISSN (Print)0163-1918

Conference

Conference2012 IEEE International Electron Devices Meeting, IEDM 2012
Country/TerritoryUnited States
CitySan Francisco, CA
Period10/12/1213/12/12

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