Highly Stable Thin-Film Transistors Based on Amorphous Perovskite Semiconductors

Hyoung Do Kim, Ji Min Park, Ho Hyun Nahm, Hyun Suk Kim

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this work, Indium-free amorphous Zn-Ba-Sn-O (ZBTO) thin films and resulting thin-film transistor (TFT) characteristics were investigated. ZBTO films were fabricated by co-sputtering system, using ZnSnO3 (ZTO) and BaSnO3 (BTO) ceramic targets. The BaSnO3 was selected because of its relatively large heat of formation compared to ZTO, and therefore enhancing structural ordering and less defective structure. The applied BTO target power was varied to investigate Ba content effect on TFT performances. X-ray photoelectron spectroscopy (XPS) and absorption spectra revealed that the subgap states including tail states were significantly suppressed by Ba incorporation. Moreover, it was found that the optimized ZBTO TFTs shown field effect mobility value over 20 cm2/Vs in saturation regime, and ultrastable stability (ΔVth < 1.0 V) under negative bias illumination stress (NBIS).

Original languageEnglish
Title of host publicationDigest of Technical Papers - SID International Symposium
EditorsKelly Jean Fitzsimmons
PublisherJohn Wiley and Sons Inc
Pages1337-1340
Number of pages4
Edition1
ISBN (Electronic)9781510896161, 9781510896161, 9781510896161
DOIs
StatePublished - 2019
EventSID Symposium, Seminar, and Exhibition 2019, Display Week 2019 - San Jose, United States
Duration: 12 May 201917 May 2019

Publication series

NameDigest of Technical Papers - SID International Symposium
Number1
Volume50
ISSN (Print)0097-966X
ISSN (Electronic)2168-0159

Conference

ConferenceSID Symposium, Seminar, and Exhibition 2019, Display Week 2019
Country/TerritoryUnited States
CitySan Jose
Period12/05/1917/05/19

Keywords

  • Amorphous oxide semiconductors
  • Basno
  • Negative bias illumination stress
  • Stability
  • Znsno

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