Hydrogenation effect of InGaP grown on GaAs by molecular beam epitaxy

M. D. Kim, H. S. Park, T. I. Kim, J. Y. Lee, Y. H. Kwon, D. Y. Kim, H. Y. Cho

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

Hydrogenation effects on the electrical properties of n-type and undoped InGaP epilayers lattice matched to GaAs were investigated. It was found that hydrogenation under proper conditions can result in a Au/n-InGaP Schottky diode with good rectifying characteristics as well as effective defect passivation. These improvement were thought to result from the atomic hydrogen diffusion into InGaP which neutralized Si donors and passivated recombination centers near the surface.

Original languageEnglish
Title of host publicationProceedings of the IEEE 24th International Symposium on Compound Semiconductors, ISCS 1997
EditorsMike Melloch, Mark A. Reed
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages307-310
Number of pages4
ISBN (Print)0780338839, 9780780338838
DOIs
StatePublished - 1997
Event24th IEEE International Symposium on Compound Semiconductors, ISCS 1997 - San Diego, United States
Duration: 8 Sep 199711 Sep 1997

Publication series

NameProceedings of the IEEE 24th International Symposium on Compound Semiconductors, ISCS 1997

Conference

Conference24th IEEE International Symposium on Compound Semiconductors, ISCS 1997
Country/TerritoryUnited States
CitySan Diego
Period8/09/9711/09/97

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