TY - JOUR
T1 - Influence of yttrium doping on microstructural and optical properties of FTO thin films prepared by nebulizer spray technique
AU - Thomas, R.
AU - Mathavan, T.
AU - Shkir, Mohd
AU - AlFaify, S.
AU - Kim, Hyun Seok
AU - Kathalingam, A.
N1 - Publisher Copyright:
© 2020 Elsevier Ltd
PY - 2020/9
Y1 - 2020/9
N2 - This work demonstrates a novel attempt to enhance the optical properties of fluorine doped tin oxide (FTO) by doping rare earth element yttrium (Y) in different concentrations (0–1.5 wt.%) using nebulizer spray pyrolysis technique at 450 °C. The variation in structural, morphological, optical and electrical properties of the films due to doping are analyzed using X-ray diffraction (XRD), Raman spectroscopy, Atomic force microscope (AFM), Energy dispersive X-ray analysis (EDAX), UV–vis spectroscopy, Photoluminescence and Hall Effect measurements. The prepared films are in polycrystalline nature with tetragonal structure and its crystallite size is reduced with doping. Raman analysis shows peaks at 444 cm−1, 570 cm-1 and 790 cm-1 corresponding to Eg, Eu and B2g vibrational modes for the Y-doped FTO films. AFM measurements displays decrease in surface roughness for the doped films. Optical transmittance spectrum exhibits an increase of transmittance from 60 % to 77 % for the host material to 1.5 wt.% Y doped FTO with increase of band gap from 3.88 eV to 3.96 eV. The different optical constants such as refractive index, extinction coefficient, real and imaginary parts of dielectric constants are also reported. Ultraviolet emission at 370 nm is observed in PL spectra related to near band edge emission. Large carrier concentration 6.02 × 1019 cm-3 and small resistivity value 1.97 × 10-3 Ω-cm are observed for 1.5 wt.% Y doped FTO thin film. The obtained figure of merit value 1.9 × 10-3 Ω-1 is perfectly suitable for optoelectronic applications.
AB - This work demonstrates a novel attempt to enhance the optical properties of fluorine doped tin oxide (FTO) by doping rare earth element yttrium (Y) in different concentrations (0–1.5 wt.%) using nebulizer spray pyrolysis technique at 450 °C. The variation in structural, morphological, optical and electrical properties of the films due to doping are analyzed using X-ray diffraction (XRD), Raman spectroscopy, Atomic force microscope (AFM), Energy dispersive X-ray analysis (EDAX), UV–vis spectroscopy, Photoluminescence and Hall Effect measurements. The prepared films are in polycrystalline nature with tetragonal structure and its crystallite size is reduced with doping. Raman analysis shows peaks at 444 cm−1, 570 cm-1 and 790 cm-1 corresponding to Eg, Eu and B2g vibrational modes for the Y-doped FTO films. AFM measurements displays decrease in surface roughness for the doped films. Optical transmittance spectrum exhibits an increase of transmittance from 60 % to 77 % for the host material to 1.5 wt.% Y doped FTO with increase of band gap from 3.88 eV to 3.96 eV. The different optical constants such as refractive index, extinction coefficient, real and imaginary parts of dielectric constants are also reported. Ultraviolet emission at 370 nm is observed in PL spectra related to near band edge emission. Large carrier concentration 6.02 × 1019 cm-3 and small resistivity value 1.97 × 10-3 Ω-cm are observed for 1.5 wt.% Y doped FTO thin film. The obtained figure of merit value 1.9 × 10-3 Ω-1 is perfectly suitable for optoelectronic applications.
KW - FTO
KW - Nebulizer spray technique
KW - Optoelectronics
KW - Thin films
KW - Yttrium doping
UR - http://www.scopus.com/inward/record.url?scp=85082868168&partnerID=8YFLogxK
U2 - 10.1016/j.mtcomm.2020.101087
DO - 10.1016/j.mtcomm.2020.101087
M3 - Article
AN - SCOPUS:85082868168
SN - 2352-4928
VL - 24
JO - Materials Today Communications
JF - Materials Today Communications
M1 - 101087
ER -