Abstract
Neuromorphic computing is a rapidly emerging technology that can overcome the limitations of von Neumann-type architecture-based computing systems, offering the potential for implementing next-generation computing architectures. Here, we propose a p-type three-terminal synaptic device that successfully mimics the function of biological synapses. The proposed tellurium (Te) synaptic transistors incorporating SiO2 or Al2O3 gate dielectric layers modulate the synaptic weight─that is, the channel conductance─essential for realizing synaptic characteristics. Synaptic devices with optimal Al2O3 layers exhibit large hysteresis properties that efficiently induce conductance modulation, demonstrating low power consumption, good linearity, and short-/long-term plasticity. Furthermore, the proposed optimal Te synaptic transistor achieved a high recognition accuracy of 93.8%. These findings suggest that Te-based synaptic devices fabricated utilizing thin-film processes could enhance the efficiency of future neuromorphic computing systems.
| Original language | English |
|---|---|
| Pages (from-to) | 5371-5378 |
| Number of pages | 8 |
| Journal | ACS Applied Electronic Materials |
| Volume | 6 |
| Issue number | 7 |
| DOIs | |
| State | Published - 23 Jul 2024 |
Keywords
- high-k dielectric constant
- neuromorphic computing
- oxide gate dielectric
- synaptic transistors
- tellurium
- thin film
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