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Interfacial reaction of atomic-layer-deposited HfO2 film as a function of the surface state of an n-GaAs (100) substrate
C. Y. Kim, S. W. Cho, M. H. Cho, K. B. Chung, C. H. An, H. Kim, H. J. Lee, D. H. Ko
Research output: Contribution to journal › Article › peer-review
24
Scopus
citations