Abstract
We have investigated the p-type doping profiling of InAs nanowries (NWs) grown via the Au-assisted vapor-liquid-sold (VLS) and the self-assembled growth methods. The VLS is the most commonly used mechanism for the growth of semiconductor NWs. The VLS-grown InAs NWs, however, show a large degree of variation in their electrical resistance along their growth direction. In addition, attempts to form heavily p-type doped InAs NWs lead to a strong kinking in the shapes of the NWs, disturbing their one-dimensional growth. In contrast, the p-type doped InAs NWs grown via the self-assembled method exhibit very low and uniform electrical resistance along the growth direction of the NWs. The doping mechanisms of the InAs NWs and their growth methods are further discussed.
Original language | English |
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Pages (from-to) | 1621-1625 |
Number of pages | 5 |
Journal | Journal of the Korean Physical Society |
Volume | 64 |
Issue number | 11 |
DOIs | |
State | Published - Jun 2014 |
Keywords
- InAs
- MOCVD
- Nanowire
- Vapor phase epitaxy
- Vapor-liquid-solid