Abstract
We have investigated the p-type doping profiling of InAs nanowries (NWs) grown via the Au-assisted vapor-liquid-sold (VLS) and the self-assembled growth methods. The VLS is the most commonly used mechanism for the growth of semiconductor NWs. The VLS-grown InAs NWs, however, show a large degree of variation in their electrical resistance along their growth direction. In addition, attempts to form heavily p-type doped InAs NWs lead to a strong kinking in the shapes of the NWs, disturbing their one-dimensional growth. In contrast, the p-type doped InAs NWs grown via the self-assembled method exhibit very low and uniform electrical resistance along the growth direction of the NWs. The doping mechanisms of the InAs NWs and their growth methods are further discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 1621-1625 |
| Number of pages | 5 |
| Journal | Journal of the Korean Physical Society |
| Volume | 64 |
| Issue number | 11 |
| DOIs | |
| State | Published - Jun 2014 |
Keywords
- InAs
- MOCVD
- Nanowire
- Vapor phase epitaxy
- Vapor-liquid-solid