Abstract
Effective data processing and low power consumption of electronic devices have been demanded for artificial intelligence technologies. Here, we report IGZO-based negative capacitance field-effect transistors (IGZO NC-FETs) with stacked gate dielectrics composed of ferroelectric Hf0.5Zr0.5O2 and high-k Al2O3. The manifestation of negative capacitance behavior was confirmed by the suppression of the thermionic subthreshold swing limit resulted in the improvement of low-power switching performance. The IGZO NC-FET occurs below 30 mV/dec of a steep subthreshold swing (SS), exceptionally across a gate bias range of ±1 V. Furthermore, high-k Al2O3 as a stabilizing layer suppresses the hysteresis, effectively coupled with a conventional ferroelectric layer.
| Original language | English |
|---|---|
| Article number | 100178 |
| Journal | Materials Today Electronics |
| Volume | 14 |
| DOIs | |
| State | Published - Dec 2025 |
Keywords
- Ferroelectric HZO
- IGZO
- Low-power electronics
- Negative capacitance
- Oxide semiconductor
- Subthreshold swing