Metal oxide semiconductor-based negative capacitance field-effect transistors with a sub-threshold swing of below 30 mV/dec

  • Ji Hyeon Min
  • , Seong Cheol Jang
  • , Kyong Jae Kim
  • , You Seung Rim
  • , Hyun Suk Kim

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Effective data processing and low power consumption of electronic devices have been demanded for artificial intelligence technologies. Here, we report IGZO-based negative capacitance field-effect transistors (IGZO NC-FETs) with stacked gate dielectrics composed of ferroelectric Hf0.5Zr0.5O2 and high-k Al2O3. The manifestation of negative capacitance behavior was confirmed by the suppression of the thermionic subthreshold swing limit resulted in the improvement of low-power switching performance. The IGZO NC-FET occurs below 30 mV/dec of a steep subthreshold swing (SS), exceptionally across a gate bias range of ±1 V. Furthermore, high-k Al2O3 as a stabilizing layer suppresses the hysteresis, effectively coupled with a conventional ferroelectric layer.

Original languageEnglish
Article number100178
JournalMaterials Today Electronics
Volume14
DOIs
StatePublished - Dec 2025

Keywords

  • Ferroelectric HZO
  • IGZO
  • Low-power electronics
  • Negative capacitance
  • Oxide semiconductor
  • Subthreshold swing

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