Metal oxides and metal thin films by atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction methods for THR applications

Hongfei Liu; Chandreswar Mahata

doi:10.1016/B978-0-12-822103-7.00007-8

Metal oxides and metal thin films by atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction methods for THR applications

Hongfei Liu, Chandreswar Mahata

Department of Electronics & Electrical Engineering

Agency for Science, Technology and Research, Singapore

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

1 Scopus citations

Abstract

This chapter discusses the fundamentals and application of atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction (SILAR) methods for producing thin films that can be engineered for transparent heat regulations (THR). The thin film materials include metals and metal oxides while their surface morphological and electronic properties have been discussed with respect to their processing conditions. The potentials of these advanced thin film technologies for THP applications have been finally analyzed, addressing their remaining issues upon scaling-up toward industrializations.

Original language	English
Title of host publication	Energy Saving Coating Materials
Subtitle of host publication	Design, Process, Implementation and Recent Developments
Publisher	Elsevier
Pages	153-182
Number of pages	30
ISBN (Electronic)	9780128221037
ISBN (Print)	9780128221044
DOIs	https://doi.org/10.1016/B978-0-12-822103-7.00007-8
State	Published - 1 Jan 2020

Keywords

atomic layer deposition (ALD)
energy saving
Liquid-ALD
metal and metal oxide thin films
smart coating
successive ionic layer adsorption and reaction (SILAR)

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10.1016/B978-0-12-822103-7.00007-8

Cite this

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Metal oxides and metal thin films by atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction methods for THR applications. / Liu, Hongfei; Mahata, Chandreswar.
Energy Saving Coating Materials: Design, Process, Implementation and Recent Developments. Elsevier, 2020. p. 153-182.

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

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T1 - Metal oxides and metal thin films by atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction methods for THR applications

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AU - Mahata, Chandreswar

PY - 2020/1/1

Y1 - 2020/1/1

N2 - This chapter discusses the fundamentals and application of atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction (SILAR) methods for producing thin films that can be engineered for transparent heat regulations (THR). The thin film materials include metals and metal oxides while their surface morphological and electronic properties have been discussed with respect to their processing conditions. The potentials of these advanced thin film technologies for THP applications have been finally analyzed, addressing their remaining issues upon scaling-up toward industrializations.

AB - This chapter discusses the fundamentals and application of atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction (SILAR) methods for producing thin films that can be engineered for transparent heat regulations (THR). The thin film materials include metals and metal oxides while their surface morphological and electronic properties have been discussed with respect to their processing conditions. The potentials of these advanced thin film technologies for THP applications have been finally analyzed, addressing their remaining issues upon scaling-up toward industrializations.

KW - atomic layer deposition (ALD)

KW - energy saving

KW - Liquid-ALD

KW - metal and metal oxide thin films

KW - smart coating

KW - successive ionic layer adsorption and reaction (SILAR)

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SN - 9780128221044

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BT - Energy Saving Coating Materials

PB - Elsevier

ER -

Metal oxides and metal thin films by atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction methods for THR applications

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Keywords

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