Nano-structured CuO on Silicon Using a Chemical Bath Deposition Process and Sputter Seed Layer

Shamili Bandaru, Chandreswar Mahata, Sabyasachi Chakrabortty, Siddhartha Ghosh, Hassan Algadi, Seeram Ramakrishna, Goutam Kumar Dalapati

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Morphological changes of copper oxide (CuO) nano-structures have been studied in detail for renewable energy and electronic applications. The CuO nano-structures were grown on a silicon substrate via a two-stage process starting with radio frequency sputtering for the seed layer followed by chemical bath deposition. The study was focused on controlling the shape and size of the CuO nano-structures depending on various growth conditions, such as reaction time, growth temperature, and vertical/horizontal orientation of the substrate containing the sputtered-grown seed layer. Structural, optical, crystallographic, and morphological characteristics of the nano-structures were obtained through field-emission scanning electron microscopy, x-ray diffraction crystallographic analysis, and UV–Vis spectroscopy.

Original languageEnglish
Pages (from-to)1779-1785
Number of pages7
JournalJournal of Electronic Materials
Volume50
Issue number4
DOIs
StatePublished - Apr 2021

Keywords

  • Nano-structures
  • copper oxide
  • growth temperature
  • silicon substrate
  • sputtering seed layer

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