TY - GEN
T1 - Nanoscale patterning of colloidal quantum dots for surface plasmon generation
AU - Park, Yeonsang
AU - Roh, Young Geun
AU - Kim, Un Jeong
AU - Chung, Dae Young
AU - Suh, Hwansoo
AU - Kim, Jineun
AU - Cheon, Sangmo
AU - Lee, Jaesoong
AU - Kim, Tae Ho
AU - Cho, Kyung Sang
AU - Lee, Chang Won
PY - 2013
Y1 - 2013
N2 - The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing, and microcontact printing of quantum dots, have limits in fabrication resolution, positioning and the variation of structural shapes. Herein, we present an adaptation of a conventional liftoff method for patterning colloidal quantum dots. This simple method is easy and requires no complicated processes. Using this method, we formed straight lines, rings, and dot patterns of colloidal quantum dots on metallic substrates. Notably, patterned lines approximately 10 nm wide were fabricated. The patterned structures display high resolution, accurate positioning, and well-defined sidewall profiles. To demonstrate the applicability of our method, we present a surface plasmon generator elaborated from quantum dots.
AB - The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing, and microcontact printing of quantum dots, have limits in fabrication resolution, positioning and the variation of structural shapes. Herein, we present an adaptation of a conventional liftoff method for patterning colloidal quantum dots. This simple method is easy and requires no complicated processes. Using this method, we formed straight lines, rings, and dot patterns of colloidal quantum dots on metallic substrates. Notably, patterned lines approximately 10 nm wide were fabricated. The patterned structures display high resolution, accurate positioning, and well-defined sidewall profiles. To demonstrate the applicability of our method, we present a surface plasmon generator elaborated from quantum dots.
KW - colloidal quantum dot
KW - electron beam lithography
KW - finite-difference time-domain simulation
KW - lift-off process
KW - nanoscale patterning
KW - surface plasmon generator
UR - http://www.scopus.com/inward/record.url?scp=84878132164&partnerID=8YFLogxK
U2 - 10.1117/12.2003055
DO - 10.1117/12.2003055
M3 - Conference contribution
AN - SCOPUS:84878132164
SN - 9780819493828
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
T2 - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
Y2 - 5 February 2013 through 6 February 2013
ER -