Origin of luminescence from Si--implanted (11̄02) Al 2O3

  • C. J. Park
  • , Y. H. Kwon
  • , Y. H. Lee
  • , T. W. Kang
  • , H. Y. Cho
  • , Sung Kim
  • , Suk Ho Choi
  • , R. G. Elliman

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

The structural and luminescence properties of nc-Si in (11̄02) sapphires were analyzed using cathodoluminescence (CL), photoluminescence (PL), and transmission electron microscopy (TEM). Si crystallite of about 4 to 5 nm diameter were created by implantation with 30-keV Si ions and sunsequent annealing at 1100 °C with extended defects. The anealing temperature and the implant dose strongly affected the luminescence properties of the samples which were compared to O-- and Al--implanted Al 2O3. All the other bands were found to be defect related, with the exception of CL band, that was nanocrystal related.

Original languageEnglish
Pages (from-to)2667-2669
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number14
DOIs
StatePublished - 5 Apr 2004

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