Rapid patterning of single-wall carbon nanotubes by interlayer lithography

Dong Seok Leem; Sungsoo Kim; Ji Whan Kim; Jung Inn Sohn; Angharad Edwards; Jingsong Huang; Xuhua Wang; Jang Joo Kim; Donal D.C. Bradley; John C. Demello

doi:10.1002/smll.201000971

Rapid patterning of single-wall carbon nanotubes by interlayer lithography

Dong Seok Leem
, Sungsoo Kim
, Ji Whan Kim
, Jung Inn Sohn
, Angharad Edwards
, Jingsong Huang
, Xuhua Wang
, Jang Joo Kim
, Donal D.C. Bradley
, John C. Demello

Department of Physics

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells.

Original language	English
Pages (from-to)	2530-2534
Number of pages	5
Journal	Small
Volume	6
Issue number	22
DOIs	https://doi.org/10.1002/smll.201000971
State	Published - 22 Nov 2010

Keywords

carbon nanotubes
interlayer lithography
patterning
solar cells
spray-coating

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10.1002/smll.201000971

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title = "Rapid patterning of single-wall carbon nanotubes by interlayer lithography",

abstract = "High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells.",

keywords = "carbon nanotubes, interlayer lithography, patterning, solar cells, spray-coating",

author = "Leem, \{Dong Seok\} and Sungsoo Kim and Kim, \{Ji Whan\} and Sohn, \{Jung Inn\} and Angharad Edwards and Jingsong Huang and Xuhua Wang and Kim, \{Jang Joo\} and Bradley, \{Donal D.C.\} and Demello, \{John C.\}",

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doi = "10.1002/smll.201000971",

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T1 - Rapid patterning of single-wall carbon nanotubes by interlayer lithography

AU - Leem, Dong Seok

AU - Kim, Sungsoo

AU - Kim, Ji Whan

AU - Sohn, Jung Inn

AU - Edwards, Angharad

AU - Huang, Jingsong

AU - Wang, Xuhua

AU - Kim, Jang Joo

AU - Bradley, Donal D.C.

AU - Demello, John C.

PY - 2010/11/22

Y1 - 2010/11/22

N2 - High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells.

AB - High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells.

KW - carbon nanotubes

KW - interlayer lithography

KW - patterning

KW - solar cells

KW - spray-coating

UR - https://www.scopus.com/pages/publications/78649647573

U2 - 10.1002/smll.201000971

DO - 10.1002/smll.201000971

M3 - Article

C2 - 20957620

AN - SCOPUS:78649647573

SN - 1613-6810

VL - 6

SP - 2530

EP - 2534

JO - Small

JF - Small

IS - 22

ER -

Rapid patterning of single-wall carbon nanotubes by interlayer lithography

Abstract

Keywords

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