TY - JOUR
T1 - Real-time observation of Ti silicide epitaxial islands growth with the photoelectron emission microscopy
AU - Yang, W.
AU - Ade, H.
AU - Nemanich, R. J.
PY - 1998
Y1 - 1998
N2 - The formation of nanoscale Ti silicide islands was observed by Photo-electron emission microscopy (PEEM). The islands were prepared by deposition of an ultrathin Ti (3-12 ML) on Si(001) at room temperature and at an elevated temperature of 950 °C. The island formation was initiated by in situ annealing to 1150 °C. It was observed that initially Ti silicide islands form while longer annealing indicates some islands move and coalesce with other islands. Most of the islands are similar in size and have relatively uniform separation. Also, it was shown that for continued Ti deposition at a temperature of 950 °C, the density of islands did not increase. However, islands grew together when their perimeter lines touch each other. The results are described in terms of island growth processes of coalescence and ripening.
AB - The formation of nanoscale Ti silicide islands was observed by Photo-electron emission microscopy (PEEM). The islands were prepared by deposition of an ultrathin Ti (3-12 ML) on Si(001) at room temperature and at an elevated temperature of 950 °C. The island formation was initiated by in situ annealing to 1150 °C. It was observed that initially Ti silicide islands form while longer annealing indicates some islands move and coalesce with other islands. Most of the islands are similar in size and have relatively uniform separation. Also, it was shown that for continued Ti deposition at a temperature of 950 °C, the density of islands did not increase. However, islands grew together when their perimeter lines touch each other. The results are described in terms of island growth processes of coalescence and ripening.
UR - http://www.scopus.com/inward/record.url?scp=0032303196&partnerID=8YFLogxK
U2 - 10.1557/proc-533-197
DO - 10.1557/proc-533-197
M3 - Conference article
AN - SCOPUS:0032303196
SN - 0272-9172
VL - 533
SP - 197
EP - 202
JO - Materials Research Society Symposium Proceedings
JF - Materials Research Society Symposium Proceedings
T2 - Proceedings of the 1998 MRS Spring Symposium
Y2 - 13 April 1998 through 17 April 1998
ER -