Relationships between electroless plating temperature, Pd film thickness and hydrogen separation performance of Pd-coated Al2O3 hollow fibers

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Abstract

The present work aims to study the formation of Pd thin film at different electroless plating temperatures and optimize the operating conditions to increase the hydrogen permeation performances of Pd-coated Al2O3 hollow fibers. Deposition of Pd thin films on the structured Al2O3 hollow fiber substrate was systematically investigated at different electroless plating temperatures (30 °C, 40 °C, and 50 °C). Herein, we present data about the effects of the electroless plating temperature on the hydrogen separation properties over a wide temperature range from 350 °C to 450 °C. The Pd thin film thickness is an inverse function of the bath temperature, and the hydrogen flux is primarily dependent on the thickness. The hydrogen fluxes increase with increasing electroless plating temperature.

Original languageEnglish
Article number127811
JournalMaterials Letters
Volume272
DOIs
StatePublished - 1 Aug 2020

Keywords

  • AlO hollow fiber substrate
  • Electroless plating
  • Hydrogen separation performance
  • Metals and alloys
  • Pd-based membranes
  • Thin films

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