Review on Se-and S-doped hydrogenated amorphous silicon thin films

Sanjeev K. Sharma, Hyunsik Im, Deuk Young Kim, R. M. Mehra

Research output: Contribution to journalReview articlepeer-review

13 Scopus citations

Abstract

Hydrogenated amorphous silicon thin films manufactured by plasma deposition techniques are widely used in electronic and optoelectronic devices. The optical and electrical properties of undoped and doped hydrogenated amorphous silicon (a-Si:H) thin films determine the importance and characteristics of the final film structure of practical devices. In particular, a-Si:H thin film solar cells and optical sensors have many industrial and technical advantages, such as being light weight, low cost, and having a large deposition area. The a-Si:H thin film is one of the candidates for flexible solar cells for use in space. This article reviews the optical and electrical properties of double donor Se-and S-doped a-Si:H thin films, which can be considered as an alternative to wide bandgap absorbing layers in the next generation of optoelectronic devices.

Original languageEnglish
Pages (from-to)293-313
Number of pages21
JournalIndian Journal of Pure and Applied Physics
Volume52
Issue number5
StatePublished - May 2014

Keywords

  • Conduction mechanism
  • Double donor
  • Electrical properties
  • Hydrogenated amorphous silicon
  • Optical properties

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