Abstract
We have observed the red shift of the emission wavelength in InGaAs/GaAs quantum dots by employing a very thin AlGaAs insertion layer (IL). The thin AlGaAs layer of less than 10 nm in thickness was inserted immediately after the formation of selfassembled InGaAs quantum dots (QDs) on a GaAs buffer layer. The low temperature (15 K) photoluminescence peak typically appears at around 1.1 μm in the sample without IL whereas it is red-shifted up to 1.25 μm as the IL thickness increases. It is interpreted that the thin AlGaAs IL releases the local strain around QDs asymmetrically.
Original language | English |
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Pages (from-to) | 4378-4381 |
Number of pages | 4 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 41 |
Issue number | 6 B |
DOIs | |
State | Published - Jun 2002 |
Keywords
- AIGaAs insertion layer (IL)
- InGaAs/GaAs quantum dots
- Local strain
- Metal organic chemical vapor deposition
- Red-shift