Single flake homo p-n diode of MoTe2 enabled by oxygen plasma doping

Irsa Zulfiqar, Sania Gul, Hafiz Aamir Sohail, Iqra Rabani, Saima Gul, Malik Abdul Rehman, Saikh Mohammad Wabaidur, Muhammad Yasir, Inam Ullah, Muhammad Asghar Khan, Shania Rehman, Muhammad Farooq Khan

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Two-dimensional (2D) materials play a crucial role as fundamental electrical components in modern electronics and optoelectronics next-generation artificial intelligent devices. This study presents a methodology for creating a laterally uniform p-n junction by using a partial oxygen plasma-mediated strategy to introduce p-type doping in single channel MoTe2device. The MoTe2field effect transistors (FETs) show high electron mobility of about ~23.54 cm2V-1s-1and a current ON/OFF ratio of ~106 while p-type FETs show hole mobility of about ~9.25 cm2V-1s-1and current ON/OFF ratio ~105along with artificially created lateral MoTe2 p-n junction, exhibited a rectification ratio of ~102and ideality factor of ~1.7 which is proximity to ideal-like diode. Thus, our study showed a diversity in the development of low-power nanoelectronics of next-generation integrated circuits.

Original languageEnglish
Article number20230207
JournalNanotechnology Reviews
Volume13
Issue number1
DOIs
StatePublished - 1 Jan 2024

Keywords

  • field effect transistor
  • MoTehomojunction diode
  • TMDs

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