Spectroscopic differentiation between O-atom vacancy and divacancy defects, respectively, in TiO2 and HfO2 by X-ray absorption spectroscopy

G. Lucovsky, K. B. Chung, J. W. Kim, D. Norlund

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Defect state features have been detected in second derivative O K edge spectra for thin films of nano-crystalline TiO2 and HfO2. Based on soft X-ray photoelectron band edge spectra, and the occurrence of occupied band edge 4f states in Gd(Sc,Ti)O3, complementary spectroscopic features have been confirmed in the pre-edge (<530 eV) and vacuum continuum (>545 eV) regimes of O K edge spectra. Qualitatively similar spectral features have been obtained for thin films of HfO2 and TiO2, and these have been assigned to defect states associated with vacancies. The two electrons/removed O-atom are not distributed uniformly over the TM atoms defining the vacancy geometry, but instead are localized in equivalent d-states: a d2 state for a Ti monovacancy and a d4 state for a Hf divacancy. This new model for electronic structure provides an unambiguous way to differentiate between monovacancy and divacancy arrangements, as well as immobile (or fixed) and mobile vacancies.

Original languageEnglish
Pages (from-to)1676-1679
Number of pages4
JournalMicroelectronic Engineering
Volume86
Issue number7-9
DOIs
StatePublished - Jul 2009

Keywords

  • Bound resonance states
  • Divacancies
  • Immobile and mobile vacancies
  • Monovacancies
  • Pre-edge regime
  • X-ray absorption spectroscopy

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