Statistical TDDB Degradation in Memory Circuits: Bit-Cells to Arrays

Chih Hsiang Ho, Soo Youn Kim, Georgios D. Panagopoulos, Kaushik Roy

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

A physics-based SPICE model that takes into account the statistical impacts of both successive and progressive oxide breakdowns is presented to evaluate the time-dependent dielectric breakdown (TDDB)-induced performance degradation in static random access memory cells and peripheral circuits. The postbreakdown I-V characteristics and the distribution of time to breakdown (tBD) have been verified against experimental data from 45-nm Silicon on insulator technology. We show that peripheral circuits, such as word-line driver, sense amplifier, and write driver, also contribute to degradation of performance during read and write operations. Using the model, the statistical impact of TDDB on sensing delay and write access time can be properly modeled for read and write failure prediction.

Original languageEnglish
Article number7463530
Pages (from-to)2384-2390
Number of pages7
JournalIEEE Transactions on Electron Devices
Volume63
Issue number6
DOIs
StatePublished - Jun 2016

Keywords

  • Oxide breakdown
  • static random access memory (SRAM)
  • time-dependent dielectric breakdown (TDDB).

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