Sub-half-micrometer width 2-D MESFET

W. C.B. Peatman, R. Tsai, T. Ytterdal, M. Hurt, H. Park, J. Gonzales, M. Shur

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Two-dimensional (2-D) MESFET's having sub-half-micron channel widths have been fabricated on double-δ-doped Al0.24Ga0.76As/In0.18Ga0.82As/GaAs heterostructures. The 2-D MESFET operates like a normal transistor at room temperature but uses very few electrons in the channel (about 500 at peak current and 5 at threshold). Also, the Narrow Channel Effect (NCE) and Drain-Induced Barrier Lowering (DIBL) (two effects which limit the minimum power operation in conventional devices) have been practically eliminated. The 0.4 micron wide device had an ON/OFF current ratio of 105, a peak transconductance of 100 mS/mm, a threshold voltage of 0.3 V, a saturation voltage of 0.2 V, and a subthreshold ideality factor of 1.1. The 2-D MESFET DCFL inverter had a switching voltage and noise margin of 0.35 V and 0.26 V, respectively, at 0.8 V supply. These room temperature results suggest that the 2-D MESFET is an excellent candidate for future low power digital eletronics applications.

Original languageEnglish
Pages (from-to)40-42
Number of pages3
JournalIEEE Electron Device Letters
Volume17
Issue number2
DOIs
StatePublished - Feb 1996

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