Sub-wavelength metal nanostructure fabrication by parallel dip-pen nanolithography

Jae Won Jang, Saju R. Nettikadan

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Metal nanostructures at sub-wavelength scale have been used as plasmonic diffraction gratings and negative index metamaterials and have attracted interests in materials engineering and optics research. E-beam lithography is commonly used to fabricate these metal nanostructures; however, e-beam lithography has limitation in scale-up of nanostructure fabrication and is expensive. In this study, a low cost and convenient scale-up fabrication method for metal nanostructures using Dip Pen Nanolithography® (DPN®) is demonstrated. DPN was used to deposit alkanethiol patterns, which were then used as etch resists for top-down nanofabrication processes to generate Au nano-features. As a proof of concept, arrays of three different designed double-ring Split-Ring Resonators (SRRs) were fabricated by DPN printing.

Original languageEnglish
Title of host publicationTechnical Proceedings of the 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011
Pages92-95
Number of pages4
StatePublished - 2011
EventNanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011 - Boston, MA, United States
Duration: 13 Jun 201116 Jun 2011

Publication series

NameTechnical Proceedings of the 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011
Volume2

Conference

ConferenceNanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011
Country/TerritoryUnited States
CityBoston, MA
Period13/06/1116/06/11

Keywords

  • Alkanethiol
  • Dip-pen nanolithography
  • Metal nanostructure
  • Metamaterials

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