TY - JOUR
T1 - Surface defects impeded excitons in Alq 3 based hetero junction OLEDs
AU - Jesuraj, P. Justin
AU - Jeganathan, K.
PY - 2013
Y1 - 2013
N2 - Hetero junction organic light emitting device consists of N,N′-diphenyl-N,N′-bis(3-methylphenyl)-1,1′-biphenyl-4, 4′-diamine (TPD)/tris-(8-hydroxyquinoline)aluminum (Alq 3 )/LiF/Al were fabricated on indium tin oxide coated corning glass substrate under various Alq 3 deposition rates. We demonstrate the significance of deposition rate on the morphology of Alq 3 layers and subsequently generation of photons in TPD/Alq 3 hetero junction. The pin holes formed on the surface of Alq 3 at low deposition rates are responsible for exciton quenching. The device fabricated with the deposition rate of 3.0 */s exhibits the maximum luminescence and maximum current efficiency of 1.02 × 10 4 cd/m 2 and ∼5 cd/A, respectively, at 15 V owing to the efficient recombination of excitons in Alq 3 emissive layer.
AB - Hetero junction organic light emitting device consists of N,N′-diphenyl-N,N′-bis(3-methylphenyl)-1,1′-biphenyl-4, 4′-diamine (TPD)/tris-(8-hydroxyquinoline)aluminum (Alq 3 )/LiF/Al were fabricated on indium tin oxide coated corning glass substrate under various Alq 3 deposition rates. We demonstrate the significance of deposition rate on the morphology of Alq 3 layers and subsequently generation of photons in TPD/Alq 3 hetero junction. The pin holes formed on the surface of Alq 3 at low deposition rates are responsible for exciton quenching. The device fabricated with the deposition rate of 3.0 */s exhibits the maximum luminescence and maximum current efficiency of 1.02 × 10 4 cd/m 2 and ∼5 cd/A, respectively, at 15 V owing to the efficient recombination of excitons in Alq 3 emissive layer.
KW - Atomic Force microscopy
KW - Luminescence
KW - Organic semiconductors
KW - Thin films
UR - https://www.scopus.com/pages/publications/84875415359
U2 - 10.1016/j.apsusc.2012.12.086
DO - 10.1016/j.apsusc.2012.12.086
M3 - Article
AN - SCOPUS:84875415359
SN - 0169-4332
VL - 268
SP - 323
EP - 326
JO - Applied Surface Science
JF - Applied Surface Science
ER -