Surface-stress-induced Mott transition and nature of associated spatial phase transition in single crystalline VO2 nanowires

Jung Inn Sohn, Heung Jin Joo, Docheon Ahn, Hyun Hwi Lee, Alexandra E. Porter, Kinam Kim, Dae Joon Kang, Mark E. Wellandt

Research output: Contribution to journalArticlepeer-review

154 Scopus citations

Abstract

We demonstrate that the Mott metal-insulator transition (MIT) In single crystalline VO2 nanowires is strongly mediated by surface stress as a consequence of the high surface area to volume ratio of individual nanowires. Further, we show that the stress-Induced ntiferromagnetic Mott insulating phase Is critical In controlling the spatial extent and distribution of the insulating monoclinic and metallic rutile phases as well as the electrical characteristics of the Mott transition. This affords an understanding of the relationship between the structural phase transition and the Mott MIT.

Original languageEnglish
Pages (from-to)3392-3397
Number of pages6
JournalNano Letters
Volume9
Issue number10
DOIs
StatePublished - 14 Oct 2009

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