TY - JOUR
T1 - Temporal data learning of ferroelectric HfAlOx capacitors for reservoir computing system
AU - Lee, Jungwoo
AU - Lee, Seungjun
AU - Kim, Jihyung
AU - Emelyanov, Andrey
AU - Kim, Sungjun
N1 - Publisher Copyright:
© 2024 Elsevier B.V.
PY - 2024/6/30
Y1 - 2024/6/30
N2 - Extensive research has been directed towards HfOx-based ferroelectric capacitor in contrast to perovskite-based ferroelectric capacitors. HfOx-based ferroelectric capacitor present advantages for high-density memory applications due to their compatibility with complementary metal-oxide semiconductor technology, efficient power consumption, and rapid operational capabilities. Particularly, Al-doped HfOx exhibits superior ferroelectric properties owing to the smaller atomic radius of Al compared to Hf. This study conducts electrical analysis by varying the type of metal electrode (W, Mo, TiN, and Ni) in the metal-ferroelectric-insulator-semiconductor (MFIS) device to achieve excellent ferroelectric memory performance. The choice of W as the metal electrode, characterized by a smaller thermal expansion coefficient (4.59 × 10−6/°C) compared to the other three electrodes, results in a high remnant polarization value (18.35 µC/cm2). Additionally, W demonstrates a stable high on/off ratio at low voltages, as verified by the I–V characteristics. Nonetheless, the ferroelectric capacitor within the MFIS structure experiences a depolarization field in the opposite direction of the aligned polarization. Consequently, a minor issue arises regarding retention loss. This phenomenon will be leveraged in reverse to demonstrate encompassing paired-pulse facilitation, spike-timing-dependent plasticity, spike-rate dependent plasticity, and long-term potentiation and depression among various synaptic applications in neuromorphic computing. In conclusion, we successfully implemented a 4-bit reservoir computing system utilizing a physical reservoir. This demonstration serves as evidence that reservoir computing is well-suited for application in image recognition technology. This comprehensive approach underscores the significant potential of W/HfAlOx-based ferroelectric capacitors in advancing artificial neural networks, aligning with the innovative trajectory of memristor technology.
AB - Extensive research has been directed towards HfOx-based ferroelectric capacitor in contrast to perovskite-based ferroelectric capacitors. HfOx-based ferroelectric capacitor present advantages for high-density memory applications due to their compatibility with complementary metal-oxide semiconductor technology, efficient power consumption, and rapid operational capabilities. Particularly, Al-doped HfOx exhibits superior ferroelectric properties owing to the smaller atomic radius of Al compared to Hf. This study conducts electrical analysis by varying the type of metal electrode (W, Mo, TiN, and Ni) in the metal-ferroelectric-insulator-semiconductor (MFIS) device to achieve excellent ferroelectric memory performance. The choice of W as the metal electrode, characterized by a smaller thermal expansion coefficient (4.59 × 10−6/°C) compared to the other three electrodes, results in a high remnant polarization value (18.35 µC/cm2). Additionally, W demonstrates a stable high on/off ratio at low voltages, as verified by the I–V characteristics. Nonetheless, the ferroelectric capacitor within the MFIS structure experiences a depolarization field in the opposite direction of the aligned polarization. Consequently, a minor issue arises regarding retention loss. This phenomenon will be leveraged in reverse to demonstrate encompassing paired-pulse facilitation, spike-timing-dependent plasticity, spike-rate dependent plasticity, and long-term potentiation and depression among various synaptic applications in neuromorphic computing. In conclusion, we successfully implemented a 4-bit reservoir computing system utilizing a physical reservoir. This demonstration serves as evidence that reservoir computing is well-suited for application in image recognition technology. This comprehensive approach underscores the significant potential of W/HfAlOx-based ferroelectric capacitors in advancing artificial neural networks, aligning with the innovative trajectory of memristor technology.
KW - Ferroelectric capacitor
KW - Image recognition
KW - Metal electrode
KW - Reservoir computing
KW - Spike-rate dependent plasticity
KW - Synaptic properties
UR - https://www.scopus.com/pages/publications/85190287152
U2 - 10.1016/j.jallcom.2024.174371
DO - 10.1016/j.jallcom.2024.174371
M3 - Article
AN - SCOPUS:85190287152
SN - 0925-8388
VL - 990
JO - Journal of Alloys and Compounds
JF - Journal of Alloys and Compounds
M1 - 174371
ER -