The effects of a thermal recovery process in In-Ga-Zn-O (IGZO) thin films transistor

Hyung Youl Park, Gwangwe Yoo, Hanjae Lee, Myung Hoon Lim, Jung Woo Baek, Changhwan Choi, Jin Hong Park

Research output: Contribution to journalArticlepeer-review

Abstract

In this paper, we demonstrated the effect of titanium (Ti) diffusion and modulation of interface traps by carrying out an annealing process on In-Ga-Zn-O (IGZO). The effect of diffused Ti atoms from the source/drain (S/D) electrodes was systematically investigated through secondary ion mass spectroscopy, X-ray photoelectron spectroscopy, HSC chemistry simulation, and electrical measurements. Higher concentrations of Ti and oxygen vacancies were observed with increasing annealing temperature. In addition, we demonstrated that the electrical stability of the IGZO thin films transistors (TFTs) was enhanced by a second thermal annealing process performed at temperature 50°C lower than the first annealing step to diffuse Ti atoms in the lateral direction with minimal effects on the channel conductivity. As a result, we obtained a threshold voltage shift (ΔVTH) of only 2.9 V after the first annealing step at 300°C for 1 hour and a second annealing step at 250°C for 3 hours with a channel length of 4 μm.

Original languageEnglish
Pages (from-to)11509-11512
Number of pages4
JournalJournal of Nanoscience and Nanotechnology
Volume16
Issue number11
DOIs
StatePublished - 2016

Keywords

  • In-Ga-Zn-O (IGZO)
  • Oxygen vacancy
  • Thermal recovery
  • Thin film transistor
  • Ti diffusion

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