The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films

Jae Ho Kim; Tae Yeon Seong; Kyung Jun Ahn; Kwun Bum Chung; Hae Jun Seok; Hyeong Jin Seo; Han Ki Kim

doi:10.1016/j.apsusc.2018.01.318

The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films

Jae Ho Kim, Tae Yeon Seong, Kyung Jun Ahn, Kwun Bum Chung, Hae Jun Seok, Hyeong Jin Seo, Han Ki Kim

Department of Physics

Research output: Contribution to journal › Article › peer-review

63 Scopus citations

Abstract

We report the characteristics of Sn-doped In ₂ O ₃ (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.

Original language	English
Pages (from-to)	1211-1218
Number of pages	8
Journal	Applied Surface Science
Volume	440
DOIs	https://doi.org/10.1016/j.apsusc.2018.01.318
State	Published - 15 May 2018

Keywords

Cylindrical rotating magnetron sputtering
Preferred orientation
Sn-doped In O
Thickness
Transparent conducting electrodes

Access to Document

10.1016/j.apsusc.2018.01.318

Cite this

@article{261a798bdfcc4d2ca6ceafeb52fdefd3,

title = "The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films",

abstract = " We report the characteristics of Sn-doped In 2 O 3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.",

keywords = "Cylindrical rotating magnetron sputtering, Preferred orientation, Sn-doped In O, Thickness, Transparent conducting electrodes",

author = "Kim, {Jae Ho} and Seong, {Tae Yeon} and Ahn, {Kyung Jun} and Chung, {Kwun Bum} and Seok, {Hae Jun} and Seo, {Hyeong Jin} and Kim, {Han Ki}",

note = "Publisher Copyright: {\textcopyright} 2018 Elsevier B.V.",

year = "2018",

month = may,

day = "15",

doi = "10.1016/j.apsusc.2018.01.318",

language = "English",

volume = "440",

pages = "1211--1218",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films

AU - Kim, Jae Ho

AU - Seong, Tae Yeon

AU - Ahn, Kyung Jun

AU - Chung, Kwun Bum

AU - Seok, Hae Jun

AU - Seo, Hyeong Jin

AU - Kim, Han Ki

PY - 2018/5/15

Y1 - 2018/5/15

N2 - We report the characteristics of Sn-doped In 2 O 3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.

AB - We report the characteristics of Sn-doped In 2 O 3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.

KW - Cylindrical rotating magnetron sputtering

KW - Preferred orientation

KW - Sn-doped In O

KW - Thickness

KW - Transparent conducting electrodes

UR - http://www.scopus.com/inward/record.url?scp=85041410163&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2018.01.318

DO - 10.1016/j.apsusc.2018.01.318

M3 - Article

AN - SCOPUS:85041410163

SN - 0169-4332

VL - 440

SP - 1211

EP - 1218

JO - Applied Surface Science

JF - Applied Surface Science

ER -

The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this