Abstract
There is a need for a good quality p-type accumulation-mode thin film transistor (TFT) using a metal oxide semiconducting channel. P-type cuprous oxide (Cu2O) has been proposed as a suitable semiconductor, but such TFTs have suffered from unacceptably high off-state currents. This letter studies the main origin of this high off-state current. Capacitance-voltage characteristics reveal the accumulation of minority carriers (electrons) in the off-state regime (i.e., for a positive gate voltage). The activation energy extracted from the temperature dependence of the drain current as a function of gate voltage shows an abrupt lowering of the activation energy and pinning of the Fermi energy in the off-state region, which is attributed to subgap states at 0.38 eV from the conduction band minimum. This suggests that an electron flow in the off-state causes the high off-state current in p-type Cu2O TFTs and not an inability to deplete the channel of holes.
| Original language | English |
|---|---|
| Article number | 8030339 |
| Pages (from-to) | 1394-1397 |
| Number of pages | 4 |
| Journal | IEEE Electron Device Letters |
| Volume | 38 |
| Issue number | 10 |
| DOIs | |
| State | Published - Oct 2017 |
Keywords
- Cuprous oxide (CuO)
- off-state current
- p-type metal oxide
- sputtering
- thin film transistors (TFTs)
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