The performance and negative bias illumination stability of Hf-In-Zn-O thin film transistors on sputtering conditions

Hyun Suk Kim, Jin Seong Park

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

This study examined the performance and stability of amorphous Hf-In-Zn-O (a-HIZO) thin film transistors (TFTs) with different sputtering conditions (DC and RF) for the active layer. The field-effect mobility and stability under negative bias illumination stress for the DC device significantly improved to 13.7 cm2/Vs and -1.5 V shift of threshold voltage, respectively, compared to those (2.4 cm2/Vs and -2.4 V shift) for the RF device. It is suggested that the incorporation of hydrogen into the RF-sputtered HIZO film has generated larger defect states in the vicinity of the HIZO/gate insulator interface, which may act as hole trap centers. This work demonstrates that the oxide TFTs combined with DC magnetron sputtering will be a prominent candidate for commercial production of the TFT backplane toward next-generation display applications.

Original languageEnglish
Pages (from-to)220-223
Number of pages4
JournalJournal of Electroceramics
Volume32
Issue number2-3
DOIs
StatePublished - May 2014

Keywords

  • Hf-In-Zn-O (HIZO)
  • negative bias illumination stability (NBIS)
  • oxide semiconductor
  • thin film transistor

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